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  • No : 6769
  • Date of Issue : 2021/08/18 15:05
  • Last Updated : 2022/01/17 15:47
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(ICPS) Cleaning of Orifice for Axial Observation(ICPS-7510)

(ICPS) Cleaning of Orifice for Axial Observation(ICPS-7510)
Category : 

Answer

NOTE: Cleaning the orifice prevents contamination of a sample and abnormal discharge.
WARNING: Never touch the inside of the stand for three minutes after extinguishment of the plasma.
Parts number: 211-43740  Orifice ASSY
 
« Cleaning method 1 for minor stains (Wipe off with pure water) »
1. Wipe the surface of the orifice assembly with gauze moistened with pure water.
2. Remove water from the surface with gauze. 
 
« Cleaning method 2 for minor stains (Wipe off with acid solution) »
1. Wipe the surface of the orifice assembly with gauze moistened with dilute nitric acid or dilute hydrochloric acid.
2. Wipe off the acid solution with gauze moistened with pure water.
3. Remove water from the surface with gauze. 
 
« Cleaning method 3 for stubborn stains »
1. Removing the orifice
  
  1) Detach the water cooled jacket from the plasma stand.
  2) Loosen the orifice by turning it using a spanner. (use spanner 13)
  3) After the orifice is unfastened, manually turn it to remove it.
 
2. Cleaning the orifice
  1) Put the orifice in the hydrochloric acid (HCl)-2 normal solution for 2 minutes.
    NOTE: Please do not put the orifice into the hydrochloric acid (HCl) for a long time. Material begins to melt and the form of orifice changes.
    NOTE: The orifice is article of consumption.
  2) Take it out from the solution and wash it with pure water.
  3) Wipe off its surface with a piece of gauze (particularly, the surface of the tungsten chip).
    NOTE: Do not clean the orifice by ultrasonic cleaning.
 
3. Mounting the orifice
  1) Manually turn the orifice to mount it onto the jacket.
  2) Slightly tighten it with a spanner.
  3) Mount the water cooled jacket onto the plasma stand.

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